Inspection membranes with exceptional mechanical strength<\/h2>\n
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Canatu inspection membranes are designed to enhance quality control in pre- and post-lithography exposure processes. They prevent EUV-generated particles from contaminating or damaging the sensitive and expensive optics or masks, ensuring high-quality, defect-free processes with high heat resistance and EUV light transmission. In mass production since 2021, they are perfectly suited for advanced semiconductor manufacturing.<\/p>\n\n\n\n
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Ultra-thin transparent debris filters with exceptional mechanical strength and long-term durability<\/li>\n\n\n\n
Withstands high-vacuum and differential pressure environments due to high tolerance to pressure pulses<\/li>\n\n\n\n
Prevents particle contamination on photomasks by filtering debris (plasma and molten metal particles) from the EUV light source and optical path<\/li>\n\n\n\n
High EUV \/ X-Ray transmittance while selectively blocking UV, DUV, visible, and infrared radiation for optimal light passage, enabling accurate defect detection<\/li>\n\n\n\n
Flexible fabrication onto selected frames with a novel all-carbon mesh structure<\/li>\n\n\n\n
Customizable coating thickness enabling gas sealing and differential pressure control<\/li>\n<\/ul>\n\n\n <\/div>\n <\/div>\n <\/div>\n<\/div>\n\n\n\n\n\n\n
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Download technical paper<\/h2>\n
Please download the most recent 2023 SPIE Photomask + EUVL Conference proceedings to gain deeper understanding of our versatile platform technology, unique CNT synthesis and direct dry deposition benefits, common tailoring, and potential uses for our carbon nanotube membranes. <\/p>\n